You can meet ALLOS team members as presenters and participants at conferences and trade shows globally. Do not hesitate to contact us at email@example.com in advance to arrange for personal meetings.
ALLOS’ co-founder and CTO Dr. Atsushi Nishikawa is invited speaker at the 2021 International Conference on Display Technology (ICDT) held from May 30th to June 2nd in Beijing, China. He will talk about “Technologies for scaling wafer diameter up to 300 mm to enable high yield and low cost micro LED production”. It is the third time that ALLOS is invited to this prestigious conference – the only display conference organized by SID (Society of Information Display) outside of the United States and we are looking forward to return to the stage there to share latest results on large diameter, super uniform GaN-on-Si epiwafer technology and how it enables micro LED display makers to achieve high yield and low cost production.
We will look at the question which substrate material is better to address the tough cost and yield requirements of micro LED applications. Given the continued COVID-19 restrictions, ALLOS’ Alexander Loesing will present online at the World Display Industry Conference (2020 WDIC) in Hefei, China. You can register on the website and watch the conference. As always, please let us know your feedback!
ALLOS’ CTO Dr. Atsushi Nishikawa will present at Trendforce’s online seminar Micro LED Forum 2020. He will focus on how ALLOS’ 1 bin® LED epiwafer technologies contribute to high-yield and cost-competitive mass production for GaN-on-Si micro LED display application. You can register on the website and watch the webinar from July 29th to October 30th. We are looking forward to your feedback!
The challenges posed for displays in automotive applications can be addressed by the unique robustness as well as very high brightness of micro LED display. Crucially also curved and transparent displays can be created. ALLOS’ CMO Alexander Loesing is invited to present at the DFF online meeting on micro LED technology in such applications.
For the European Photonics Industry Consortium’s online meeting on micro LED technology ALLOS’ CMO Alexander Loesing was invited to present about ALLOS’ latest development results. We are looking forward meeting you online!
ALLOS’ CTO Dr. Atsushi Nishikawa will present at SID China’a Spring Online Technical Meeting. Under the presentation title “200 and 300 mm LED epiwafers – enabling cost-competitive mass production of micro LED displays” Nishikawa-san will share ALLOS latest development results, production status and vision.
SID China is the local chapter of Society of Information Display (SID) which is globally the most important association of professionals, companies and organizations from both industry and academia in the field of visual information technology. We are looking forward to meeting you life online!
In the meantime, please do not hesitate to contact us at firstname.lastname@example.org to arrange a video conference or webinar. Stay safe – we wish you and your families all the best!
We are pleased to be invited again to present our latest results at the joint conference of SSL China and IFWS in Shenzhen, Guangdong, China from 25th to 27th November. During SSL China we will present about our 1 bin® micro LED technology being ready for production and at IFWS about the benefits of our unique approach to avoid carbon-doping in GaN-on-Si for high power electronics.
ALLOS’ CEO Burkhard Slischka will present at International Micro LED Display Conference at Touch Taiwan on August 29th about „What is the right LED epiwafer strategy for mass production of micro LED displays?“
At prestigious SID’s Display Week ALLOS’ Burkhard Slischka will give an invited talk to present the company’s latest generation of GaN-on-Si high performance material for micro LED display applications like AR, automotive and consumer electronics. Display Week is the perhaps most important conference of the global display industry and will take place between May 14th and 19th in San Jose, USA. The entire ALLOS team is proud to have this opportunity and looks forward to see you in the audience!
As every year, ALLOS will not miss this must see event showcasing all the latest development in high power electronics: PCIM in Nürnberg, Germany. Alexander Loesing of ALLOS will participate on all three days of the exhibition from May 7th to 9th.
SID invited ALLOS to present about its micro LED technology at the International Conference on Display Technology (ICDT) in Kunshan, Suzhou. ICDT is hosted by – among others – SID at the Kunshan International Convention and Exhibition Center, Suzhou from March 26th to 29th.
Join ALLOS’ CEO Burkhard Slischka again this year at CS International conference in Brussels from March 25th to 27th. Keep your fingers crossed with us as ALLOS is, for the fourth time in just four and a half years of being in business, nominated for the industry-peer CS Award. With your help we might get it rewarded again after our victory in 2018!
Dr. Nishikawa will give an invited talk at the International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma) which is held at Nagoya Institute of Technology, Aichi, Japan from March 17th to 21st.
On February 6th Dr. Nishikawa will present an invited talk at Photonics West in San Francisco, United States, titled “Achieving high uniformity and yield for micro LED applications with precisely strain-engineered large-diameter epiwafers (Session 8: Paper 10940-71)”.
On November 12th ALLOS’ CTO Dr. Atsushi Nishikawa together with executives from MOCVD equipment maker Veeco Inc. will give a luncheon seminar at the International Workshop on Nitride semiconductors (IWN) in Kanazawa, Japan and talk about our latest 200 mm results for micro and other novel LED application. Places at this invitation-only event are limited, please register through the IWN webpage if you would like to join.
At the same conference on November 17th, Dr. Alaleh Tajalli from University of Padova will present a GaN-on-Si HPE paper co-authored by IEMN of France and ALLOS, titled “High voltage GaN-on-silicon with low-trapping up to 1200 V (ED15-3)”.
For October 24th ALLOS’ CEO Burkhard Slischka is invited by SEMI China to talk about “GaN-on-Si manufacturing for micro LED and High Power Electronics applications” at its “Compound Semiconductor Equipment and Manufacturing Conference” in Nanchang, China.
ALLOS’ CTO Dr. Atsushi Nishikawa will explain the scientific background of ALLOS’ excellent isolation and dynamic performance in an invited talk at the prestigious E-MRS conference in Warsaw this September.
Progress on micro LED has been so fast since last year’s seminar. ALLOS’ co-founder and CTO, Atsushi Nishikawa will join the Micro LED Forum this year as well on July 12th. Please catch up the recent progress on micro LED.
Attend our presentation at the upcoming meeting of Deutsches Flachdisplay Forum (DFF) on June 13th and 14th about the status of GaN-on-Si epiwafer technology and ALLOS’ view on micro LED display development and meet our CEO Burkhard Slischka and CTO Dr. Atsushi Nishikawa.
Meet ALLOS team members again at PCIM conference and trade fair show in Nuremberg between May 5th and 7th this year.
ALLOS’ co-founder and CTO, Atsushi Nishikawa will join the scientific CSW conference on compound semiconductors from May 29th to June 1st. GaN-on-Si is one of the most challenging materials in compound semiconductors due to large lattice mismatch. He is looking forward to discussion with other experts in the compound semiconductor society.
The right place to follow the latest developments in micro LED is always SID’s Display Week THE gathering of the display industry. From ALLOS’ side Alexander Loesing is looking forward meeting you in LA from May 21st to 24th.
Since he attended CS International conference for the first time, this was a personal goal for him; this year the dream becomes true: ALLOS’ CEO Burkhard Slischka will have the honor to present ALLOS groundbreaking results about “How can GaN-on-Si compete with SiC in the market for 1200 Volt devices?” The ALLOS team will also keep their fingers crossed as we are nominated for the industry-leading CS Award not in one but even in two categories, and the winners will be announced at the conference as well! Meet us in Brussels on April 10th and 11th.
The annual Display Week of the Society for Information Display has an official offspring in China: The “International Conference on Display Technology” which will take place from April 9th to 13th. ALLOS’ Alexander Loesing has the privilege to be invited to present on “Building the micro LED value chain”. Looking forward to see you in Guangzhou.
To this year’s SEMICON Japan industry exhibition and conference from December 13th to 15th, ALLOS’ CTO Atsushi Nishikawa is invited to talk about improvements in isolation of GaN-on-Si epiwafer for high-power device application.
ALLOS’ Burkhard Slischka looks forward to the opportunity to present on November 14th at Huawei’s global “Material Forum” about micro LED display manufacturing challenges.
ALLOS’ co-founders Burkhard Slischka and Alexander Loesing are invited to present at these two important events for the Chinese compound semiconductor industry between November 1st and 3rd. We will show ALLOS’ latest development in micro LED (SSL) and high power electronics (IFWS).
A milestone for the entire ALLOS team: We are very proud to have been invited by SEMI China for the first time since starting ALLOS in 2014 to introduce ALLOS’ leading GaN-on-Si technology to the ambitious and innovative Chinese market. Join ALLOS co-founder and CEO Burkhard Slischka when he talks about “The Right Strategy for Developing GaN Power Electronics” at the CPSIC 2017 conference in Nanjing on October 24th.
GaN-on-Si for RF is having a renaissance after the boom and bust in the early 2000s. ALLOS’ co-founder Alexander Loesing is looking forward to meet old friends and make new ones at EuMW from October 8th to 13th.
Alexander Loesing is looking forward meeting you at SEMICON the big semiconductor event in Taiwan and to the attention-grabbing presentations at the Power and Compound Semiconductors Technology Forum on September 14th.
ALLOS’ co-founders, Atsushi Nishikawa and Alexander Loesing will join the prestigious ICNS nitride conference in Strasbourg from July 24th to 28th. Our CTO Dr. Nishikawa will present “Low vertical leakage current of 0.07 µm/mm2 at 600 V without intentional doping for 7 µm-thick GaN-on-Si” in the session C4.5. In the presentation, he will explain why ALLOS can achieve high isolation without carbon-doping which is unavoidable for others.
Not the short drive from our home in Dresden to Prague like last year, but equally beautiful Sapporo is the setting of this year’s ISPSD which Alexander Loesing will attend for ALLOS from May 28th to June 1st.
As part of our customer road show in the Bay and Southern California areas ALLOS’ co-founder and CEO Burkhard Slischka will attend this years’ CS Mantech conference which will be held between May 23th and 25th in Indian Wells.
Beautiful Nürnberg is again awaiting the global power electronics industry for the yearly PCIM exhibition and conference between May 16th and 18th. ALLOS’ team cannot wait to go, too.
On May 10th, Atsushi Nishikawa will join another micro LED seminar in Taiwan, organized by LEDinside. Micro LED display process consists of a lot of special technologies. ALLOS is contributing to the entire process from the epitaxial growth side and is looking forward to continue collaborating with experts on micro LED chip process and display assembly.
Micro LED is a very hot topic emerging in Taiwan! On May 9th, Atsushi Nishikawa will join the SEMI micro LED seminar and is looking forward discussing about micro LED production from epitaxial growth point of view.
To meet the local and international LED community again at the VIP lunch organized by SEMI Taiwan, the large LED Taiwan exhibition and the excellent matchmaking opportunities are good reasons to return to Taipei. Another is the presentation of our co-founder Alexander Loesing about “Who will benefit from micro LEDs with new generation GaN-on-Si?” at the TechStage on April 13th.
Florida is hosting the global power electronics industry at APEC between March 26th and 30th. Our CMO Alexander Loesing will visit as well and looks forward to many breakthroughs in GaN being presented.
Between March 6th and 8th 2017 the global semiconductor industry will meet in Brussels for the annual CS International conference to share latest developments. Meet and discuss with ALLOS’ Burkhard Slischka and Alexander Loesing too.
From October 30th to November 2nd our CTO Atsushi Nishikawa will be at the Workshop on Ultra-Precision Processing for Wide Bandgap Semiconductors (WUPP) event and present “How to master the GaN-on-Si challenges?”. You will learn how ALLOS helps you to master GaN-on-Si technology yourself.
Meeting the whole nitride community – and Mickey Mouse – between October 2nd and 7th will be on the agenda of Atsushi Nishikawa and Alexander Loesing of the ALLOS team – who are already looking forward to hear the latest developments.
Just a short drive from our home in Dresden we look forward to the exciting yearly gathering of power semiconductor experts at ISPSD from June 13th to 16th.
Like every year we are looking forward to the essential PCIM power electronics industry gathering in Nürnberg – also to enjoy the fantastic local food with you. Let’s meet between May 10th and 12th!
Since LEDs started making inroads into general lighting, the biennial Light + Building exhibition has become a good place to meet LED industry executives. From ALLOS’ side Alexander Loesing will join the crowd from March 13th to 18th 2016.
The Sheraton at Brussels’ airport will see the international compound semiconductor industry gathering at CS International to exchange about the latest developments and witness presentations from numerous industry experts. The evening reception on February 29th marks the kick-off and ALLOS’ Burkhard Slischka and Alexander Loesing will stay-on until the second conference day on March 2nd. See you in Brussels!
ALLOS’ CTO Atsushi Nishikawa is looking forward to meeting you in Hamamatsu, Japan, from November 8th to 12th. Growth of III-Nitrides is ALLOS’ key technology and challenging topic, especially growth on silicon.
Meet ALLOS’ CMO Alexander Loesing when the whole nitride community gathers for the first visit of the ICNS to China from August 30th to September 4th.
The ALLOS team is looking forward meeting you at this essential power electronics get-together from May 19th to 21st (for link to PCIM click here).