ALLOS wins prestigious CS Industry Award for Substrates and Materials 2018

A big surprise hit us this Friday and caused cheer and celebration in the ALLOS team: We won this year’s prestigious Compound Semiconductor Industry Award in the Substrates and Materials category. YES!

ALLOS will receive the award for its recent work on GaN-on-Si material for 1200 V device applications (see press release here). According to the award criteria in this category, “Great substrates and high-quality materials are key ingredients for making state-of-the-art devices. This award aims to showcase breakthroughs in this field.”

ALLOS was additionally nominated in the high-volume manufacturing award category together with Veeco for our joint work on super-uniform 200 mm GaN-on-Si epiwafers for micro LED applications (see press release here) but finished in this category behind Beneq. The other CS Industry Award winners in the respective categories are Veeco (innovation), Wolfspeed (device design and packaging) and KLA Tencor (Metrology). Congratulations to all!

The CS Industry Award winners are nominated and selected annually by the readers of the CS magazine and visitors to the award website. The awards ceremony will be on April 10th at the CS International Conference in Brussels. ALLOS’ CEO Burkhard Slischka, who will talk at the conference about “How can GaN-on-Si compete with SiC in the market for 1200 Volt devices?” and ALLOS’ CTO Dr. Atsushi Nishikawa, who is responsible for the breakthrough to above 1200 V, will be present.

ALLOS would like to thank all voters who have helped ALLOS to be nominated and to succeed among these strong competitors!