Blog Archives

Interview of i-Micronews with Veeco’s Christopher Morath and ALLOS’ Alexander Loesing

Yole Développement has today published an interview titled “ALLOS-Veeco collaboration enables better GaN-on-silicon microLEDs” with Alexander Loesing, CMO of ALLOS, and Christopher Morath, senior director, strategic marketing at Veeco. Content of the interview is to explain the collaboration between Veeco and ALLOS, what it offers to microLED manufacturing and the possible applications of GaN-on-silicon for

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ALLOS’ Dr. Nishikawa talks at SEMICON Japan about the physics and innovative techniques to improve the isolation of GaN-on-Si epiwafer

At this week’s SEMICON Japan industry exhibition ALLOS’ Atsushi Nishikawa was invited to talk about improvements in isolation of GaN-on-Si epiwafer for high-power device application. “It is a pleasure to talk in my home-country Japan” comments Nishikawa “In our opinion the power semiconductor industry needs to have a dialogue about how to achieve the required

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Invitation to present at 1st China International Micro-LED Display Summit in Nanjing

It was a great honor and pleasure for our CMO, Alexander Loesing to be invited to present ALLOS’ latest results on micro LED and meet so many of China’s and international micro LED players – as well as the heavyweights from the local and international display industry. Alexander enjoyed the open discussion about the technical

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ALLOS speaks at Huawei’s internal ‘Material Forum’ about micro LED display manufacturing challenges

Thank you to the Huawei team for inviting ALLOS’ Burkhard Slischka to speak about micro LED display manufacturing challenges at Huawei‘s internal ‘Material Forum’ conference in Munich. We enjoyed the outstanding presentations, the very interactive format and in-depth discussions with the high-level attendees. Thank you for the positive and valuable feedback! You can download a

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ALLOS’ CTO was panelist at Electronic Material Symposium in Japan

The Electronic Material Symposium held this week in Shiga, Japan organized a rump session titled ‘Does your research link with business?’ ALLOS’ CTO Dr. Atsushi Nishikawa, who was invited among other entrepreneurs in GaN and SiC devices, said “I enjoyed the fruitful discussion not only with young students and researchers but also with some of

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SSL 2017 Beijing: ALLOS unique interlayer design enables strain-free and large-diameter epiwafers without bow and cracks

ALLOS’ CEO Burkhard Slischka talks about ALLOS micro LED strategy at SSL 2017 conference in Beijing

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VEECO and ALLOS Demonstrate Industry-leading 200 mm GaN-on-Si Performance to enable Micro-LED Adoption

Plainview, N.Y., November 1, 2017 – Veeco Instruments Inc. (Nasdaq: VECO) announced today the completion of a strategic initiative with ALLOS Semiconductors (ALLOS) to demonstrate 200mm GaN-on-Si wafers for Blue/Green micro-LED production. Veeco teamed up with ALLOS to transfer their proprietary epitaxy technology onto the Propel® Single-Wafer MOCVD System to enable micro-LED production on existing

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维易科(VEECO)和ALLOS展示行业领先的200MM硅基氮化镓性能,推动micro-LED的应用

纽约普莱恩维尤(Plainview),2017年11月1日– Veeco 公司 (Nasdaq: VECO)今日宣布和ALLOS Semiconductors (ALLOS)达成了一项战略举措,展示了200mm硅基氮化镓晶圆用于蓝/绿光micro-LED的生产。维易科和ALLOS合作将其专有外延技术转移到Propel® 单晶圆MOCVD系统,从而在现有的硅生产线上实现生产micro-LED。

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VEECO和ALLOS演示業界領先的200MM GAN-ON-SILICON性能來實現MICRO-LED的應用

Plainview,N.Y.,2017年11月1日 – Veeco Instruments Inc.(Nasdaq:VECO)今天宣布與ALLOS Semiconductors(ALLOS)完成一項戰略措施,以展示200mm 矽基板用於氮化鎵藍/綠光Micro-LED的生產上。 Veeco與ALLOS合作將其專有的磊晶技術轉移到Propel® Single-Wafer MOCVD系統上,以便於現有的矽生產線上實現生產Micro-LED。

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“The Right Strategy for Developing GaN Power Electronics” – ALLOS’ CEO Burkhard Slischka talks at SEMI China’s CPSIC 2017 conference in Nanjing

SEMI China invited ALLOS’ CEO Burkhard Slischka to talk about market entry strategies into GaN-on-Si for power electronics at this year’s CPSIC conference in Nanjing.

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